Klement et al.,
ACS Appl. Mater. Interfaces
Surface Diffusion Control Enables Tailored Aspect Ratio Nanostructures in Area-Selective Atomic Layer Deposition
P. Klement, D. Anders, L. Gümbel, M. Bastianello, F. Michel, J. Schörmann, M.T. Elm, C. Heiliger, S. Chatterjee
ACS Appl. Mater. Interfaces (2021)
DOI:10.1021/acsami.0c22121
ACS Appl. Mater. Interfaces